Chemical vapor deposition of sp²-boron nitride films on Al₂O₃ (0001), (112¯0), (11¯02), and (101¯0) substrates

Ultralight boron nitride aerogels via template-assisted chemical vapor deposition

Boron nitride (BN) aerogels are porous materials with a continuous three-dimensional network structure. They are attracting increasing attention for a wide range of applications. Here, we report the template-assisted synthesis of BN aerogels by catalyst-free, low-pressure chemical vapor deposition on graphene-carbon nanotube composite aerogels using borazine as the B and N sources with a relati...

On the effect of water and oxygen in chemical vapor deposition of boron nitride

Surface Chemical States of Heteroepitaxial Nitride Films on Sapphire by Metalorganic Chemical Vapor Deposition

Surface chemical states of GaN, AlGaN and InGaN by metalorganic chemical vapor deposition, and the influence of different dopants are studied with X-ray Photoelectron Spectroscopy (XPS). The results show that for most of the samples the N 1s peak can be fitted with a dominant GaN peak and a small N–H peak, while Ga 3d can be deconvoluted into three peaks from elemental Ga, GaN and Ga2O3. Si-dop...

In Situ Observations during Chemical Vapor Deposition of Hexagonal Boron Nitride on Polycrystalline Copper

Using a combination of complementary in situ X-ray photoelectron spectroscopy and X-ray diffraction, we study the fundamental mechanisms underlying the chemical vapor deposition (CVD) of hexagonal boron nitride (h-BN) on polycrystalline Cu. The nucleation and growth of h-BN layers is found to occur isothermally, i.e., at constant elevated temperature, on the Cu surface during exposure to borazi...

Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films

Smooth and continuous films of nickel nitride (NiNx) with excellent step coverage were deposited from a novel nickel amidinate precursor, Ni(MeC(NBu)2)2, and either ammonia (NH3) or amixture of NH3 and hydrogen (H2) gases as co-reactants. The reactants were injected together in direct-liquidinjection chemical vapor deposition (DLI-CVD) processes at substrate temperatures of 160-200 C. Depending...